[Cbe-grads] FW: Intel interviews next week - apply before 3PM on 10/23

[Bennett, Angela]

FYI

[The Ohio State University]
Angela S. Bennett
Graduate Program Coordinator
William G. Lowrie Department of Chemical and Biomolecular Engineering
310 CBEC, 151 West Woodruff Avenue, Columbus, OH 43210
614-292-9076 Office / 614-292-3769 Fax
bennett.234 at osu.edu<mailto:bennett.234 at osu.edu> | cbe.osu.edu<http://cbe.osu.edu/> |  Twitter<https://twitter.com/bennett234>

From: Hambach, Jennifer <hambach.2 at osu.edu>
Sent: Friday, October 18, 2019 12:28 PM
To: Bennett, Angela <bennett.234 at osu.edu>; Dunlap, Kristina <dunlap.151 at osu.edu>; _ENG Materials Science and Engineering Dept <mse at osu.edu>; ENG ECE Grad <eng-ece-grad at osu.edu>; OSU Interdisciplinary Biophysics Graduate Program <biophysics at osu.edu>
Subject: Intel interviews next week - apply before 3PM on 10/23

Hello!

Please forward the job information below to your graduate students and postdocs. Anyone who is interested in being considered for an interview during Dr. Akhimie's visit next week should both apply online via the provided link and email their resume to Dr. Regina Akhimie at regina.akhimie at intel.com<mailto:regina.akhimie at intel.com> by 3PM on Wednesday, October 23rd.

Thank you!

Jennifer

[The Ohio State University]
Jennifer Hambach
OSU Chemistry PhD Program
Graduate Program Coordinator
CMBP & MBTP Program Coordinator
The Department of Chemistry and Biochemistry
1110 Newman Wolfrom Lab, 100 W. 18th Ave., Columbus, OH 43210
614-292-8917 Office / 614-247-7942 Fax
hambach.2 at osu.edu<mailto:hambach.2 at osu.edu>

Buckeyes consider the environment before printing.

Apply online at Thin Films Module Engineer Job ID: JR0099326<https://jobs.intel.com/ShowJob/Id/1985166/Thin-Films-Module-Engineer/>
Please also email your resume to regina.akhimie at intel.com<mailto:regina.akhimie at intel.com>

We are hiring PhD candidates in the metals thin film area. We are giving priorities to the candidates who have exceptional backgrounds in physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and/or Electrodeposition fields. Strong plasma physics and vacuum science knowledge will be needed for PVD, CVD, and ALD deposition area candidates. We are also looking at candidates with synthetic chemistry backgrounds for CVD/MOCVD (metal-organic chemical vapor deposition) precursor development. In the Electrodeposition area, we are looking for candidates with a strong background in electrochemistry.

Resumes will be accepted through 3PM on Wednesday, October 23rd for consideration for an interview at Ohio State on either Thursday, October 24th or Friday, October 25th

Regina Akhimie
PTD Thin Films - Metals
Intel Corp.
RA4-4-102-24 (J7)
Mobil: 503-901-5822
Email: regina.akhimie at intel.com<mailto:regina.akhimie at intel.com>

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